In-situ stress measurement system SIG-2000SP
Field of applikation
The stress measurement system SIG-2000SP is optimized
to measure the stress in-situ in thin films already during
their deposition onto a reference substrate. It is applicable
in nearly all kind of "box-coaters" where the system is
mounted outside the vacuum chamber leading the two laser
beams through a window.
On the substrate holder (i.e. the
calotte or the planetary system) a reference sample is
mounted inside a special sample holder. This allows to scan
the sample and determine the actual bending in every turn.
This system is very helpful in developing new film systems,
because a set of parameters, e.g. different bias voltages
can be applied during only one deposition run while the
experimenter studies the actual influence of the forming
stress.
The principle:
Technical data:
| Resolution limit: | Better than +-30MPa at a 150µm Si substrate with a 100nm film (at rpm of aprox. 60 per min.) |
| Substrates: | Nearly all materials, one side at least 3% reflectivity, typical thickness from 100µm to 1000µm |
| Sample holder: | Available for any substrate sizes smaller than 30mm x 30mm. |
| Detector: | CCD line detector, optional high-speed |
| Laser / Optic: | 650nm diode laser module. Other wavelengths available. Beam splitter produces two beams with a separation of 10mm. |
| Size: | 12cm x 12cm x 25cm |
| Weight: | 6kg |
| Software: | Special Software with data export to e.g. ".csv"-files. The complete history of measurements is saved in a clear structured database. |
| Mounting: | To connect the system to the coating system, flanges and adapters are provided by sigma-physik |
Example measurement:
